The DLC coating process employs a plasma-enhanced chemical vapor deposition (CVD) method combined with ion implantation. As illustrated in the figure on the left, a negative high-voltage pulse is applied to the substrate, which accelerates and attracts positive ions generated in the plasma through a prescribed method. These ions are then implanted into the substrate surface.

This technique enables both ion implantation into the substrate and the formation of a highly adherent DLC coating. One of its key advantages is the ability to process large areas, three-dimensional objects, and multiple components simultaneously, making it suitable for a wide range of industrial applications.

　The coating method for scanning electron microscopy (SEM) observation of viruses was presented in the following publication. The SEM and EDS mapping images shown in Figure 1B of the paper were obtained using this coating technique.

https://www.pnas.org/doi/10.1073/pnas.2203437119

The chemical structure of Diamond-like Carbon (DLC) consists of short-range carbon-carbon (C-C) bonds that include a mixture of sp³ hybridized orbitals, characteristic of diamond, and sp² hybridized orbitals, typical of graphite. This combination results in an amorphous structure overall. DLC is typically synthesized as a carbon-based thin film, and its high hardness is the reason it is referred to as "Diamond-like."

Diamond-like Carbon (DLC) is a carbon-based material with hardness comparable to that of diamond. When formed into a thin film, it is referred to as a DLC coating, which has a wide range of industrial applications.

At DLC Research Institute, our operations are based on the DLC coating technology developed by our representative during his tenure at the Nagasaki Prefectural Institute of Industrial Technology and the Graduate School of Engineering at Nagasaki University. This technology utilizes plasma source ion implantation. We provide technical development, consulting, and contract-based services related to surface treatment and materials engineering.

　Scanning Probe Microscopy Image of DLC Film Deposited on a Silicon Wafer The surface exhibits exceptional smoothness, with a measured roughness of Ra = 0.15 nm.